| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673711 | Thin Solid Films | 2009 | 4 Pages |
Abstract
Recent progress in application of Cat-CVD (Hot Wire CVD) technology is overviewed, along with recent status of industrial implementation of this technology. Although the use of Cat-CVD technology in factories has not been open to the public, the technology appears to fit for the fabrication of ultra-high frequency devices of compound semiconductors, compound semiconductor lasers, solar cells, and formation of coating films for other devices. The issues for practical use of this technology are also discussed, together with promising future of this Cat-CVD technology.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Hideki Matsumura, Keisuke Ohdaira,