| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673782 | Thin Solid Films | 2008 | 4 Pages |
Abstract
Efforts of industrial application of Cat-CVD technology are surveyed. Recent movement of industrial implementation is also reviewed by showing examples in Japanese industry. Cat-CVD technology is originally developed as a new tool for fabricating semiconductor devices, however, recently, use of the technology is attempted in various fields such as chemical, mechanical and bio-technical engineering. It is shown that Cat-CVD has high feasibility as a fundamental technology of modern industries.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Hideki Matsumura, Keisuke Ohdaira,