Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1673810 | Thin Solid Films | 2008 | 4 Pages |
Abstract
Amorphous carbon nitride, a-CNx, thin films were deposited by hot filament CVD using a carbon filament with dc negative bias voltage on the substrate. The effects of the negative bias and the filament components on the binding structure of the films are investigated by XPS. The composition ratio of graphite to amorphous carbon in the filaments affects the bonding structure of carbon and nitrogen in the films, although the nitrogen content in the films is almost same as 0.1. The nitrogen content in the films changes from 0.1 to 0.3 as the negative bias changes from 0 to − 300 V.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Masami Aono, Shinichiro Aizawa, Nobuaki Kitazawa, Yoshihisa Watanabe,