| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1673900 | Thin Solid Films | 2008 | 4 Pages |
Abstract
We employ textured α-Cr2O3 thin films as templates for growth of α-Al2O3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of α-Al2O3. Extended growth of α-Al2O3 at a substrate temperature of 450 °C is obtained using a predominantly [101̄4]-textured α-Cr2O3 template layer, while only limited α-Al2O3 nucleation is seen on a [0001]-textured α-Cr2O3 template.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
P. Eklund, M. Sridharan, M. Sillassen, J. Bøttiger,