Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1674237 | Thin Solid Films | 2007 | 4 Pages |
Abstract
The initial stage of iron silicide formation is investigated by high-resolution Rutherford backscattering spectroscopy. During the Fe deposition on Si(001) at 470 °C, the formation of FeSi2 is confirmed by the surface peak analysis. Initially, FeSi2 grows epitaxially so that one of the major crystallographic axes is parallel to the <111> axis of the Si substrate. With increasing Fe deposition, the deviation between the major crystallographic axis of the silicide region and Si<111> increases although the electron diffraction pattern is independent of the amount of Fe deposition. Therefore, the subsurface crystallographic structure of iron silicide is transformed from a cubic-like to a low-symmetry structure.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Motofumi Suzuki, Kohei Kinoshita, Shinji Jomori, Hidehiko Harada, Kaoru Nakajima, Kenji Kimura,