Article ID Journal Published Year Pages File Type
1674281 Thin Solid Films 2008 6 Pages PDF
Abstract

Chromium tungsten nitride films were deposited using magnetron sputtering with ion beam assistance. The content of the films was controlled through the power supplied to the chromium and tungsten targets. Results indicate that the tungsten atoms incorporated into chromium nitride films and formed the chromium tungsten nitride solid solution phase. Moreover, results of this study provide further insight into how various concentrations of tungsten affect the lattice constant, preferred orientation, crystallite size, surface morphology, hardness, internal stress, and adhesion of the films.

Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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