Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition

Ni thin films were electrodeposited on n-Si (100) substrate from the electrolytes containing Ni(CH3COO)2 and CH3COONH4 at room temperature. The scanning electron microscope images of the films reveals the uniform distribution of the nickel all over the substrate surface, which illustrates that the fine Ni films on large scales could be obtained through the method of electrodeposition. Vibrating sample magnetometer measurement with the applied field parallel to the surface shows obvious hysteresis loops of the magnetic thin films. The morphology and magnetism of the Ni thin films evolves with the deposition time increasing. The effect of deposition conditions on the properties of the Ni thin films is investigated.