| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1674604 | Thin Solid Films | 2008 | 4 Pages |
Abstract
Effects of the substrate temperature on early stages of film growth were investigated for tin-doped indium oxide (ITO) films deposited on alkali-free glass substrates by dc magnetron sputtering. The variations in sheet resistance, film coverage and average surface roughness showed clearly that ITO films deposited on the unheated glass (lower than 50 °C) formed by a Volmer–Weber growth mode. In contrast, such an island structure was not clearly observed for films deposited on glass substrates heated at 100, 200 and 400 °C, resulting in better film coverage. These results indicate that the nucleation densities of ITO films increase dramatically with increasing substrate temperature.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yasushi Sato, Mikihiro Taketomo, Norihiro Ito, Yuzo Shigesato,