Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1674662 | Thin Solid Films | 2006 | 6 Pages |
Abstract
A method to generate nanoporous polyimide films with low dielectric constants was proposed. The preparation consisted of two steps. Firstly, a polyimide/silica hybrid film was prepared via sol–gel process. Secondly, the hybrid film was treated with hydrofluoric acid to remove the dispersed silica particles, leaving pores with diameters between 20 and 120 nm, depending on the size of silica particles. Both hybrid and porous films were subjected to a variety of characterizations including transmission electron microscopy observation, dielectric constant measurement and tensile strength measurement.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Lizhong Jiang, Jiugui Liu, Dezhen Wu, Hangquan Li, Riguang Jin,