| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1674968 | Thin Solid Films | 2008 | 4 Pages |
Abstract
ITO:Ca composite thin films were deposited on glass substrate by the rf magnetron co-sputtering method with various numbers of Ca chips and oxygen partial pressures. The carrier concentration of the ITO:Ca thin film was 7 × 1020 cm− 3 when the number of Ca chips was 4 at an oxygen partial pressure of 1.4%. The sheet resistance and optical transmittance of the ITO:Ca thin films were 68.2 Ω/sq. and 87%, respectively. The work function of the ITO:Ca thin films with 8 Ca chips was changed from 4.6 eV to 5.0 eV when the oxygen partial pressure was increased from 0.8% to 2.2%. When the oxygen partial pressure was 1.2%, a low work function of 4.6 eV was obtained for the ITO:Ca thin films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
W.S. Jung, S.G. Yoon, S.M. Kang, S-W Kim, D.H. Yoon,