Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1674987 | Thin Solid Films | 2008 | 5 Pages |
Abstract
The plasma in a cathodic arc evaporation process used for the deposition of Cr1âxOx films was studied by an optical emission spectroscopy (OES). With the introduction of Ar and oxygen into the chamber at deposition pressures from 0.7Â Pa to 2.7Â Pa, high density of evaporated chromium catalyzes the decomposition of oxygen reactive gas, and induces the formation of Cr1âxOx films. Optical emission spectra including atomic and ionized Cr, excited and ionized oxygen revealed that excitation, ionization and charge transfer reactions of the Cr-O plasma occurred during the Cr1âxOx deposition process. A simplified empirical model which incorporates the relevant atomic processes in the gas phase with the chemical composition and deposition rate of the deposited Cr1âxOx coating was developed. Rhombohedral Cr2O3 and tetragonal CrO2 were observed in the Cr1âxOx coatings deposited at higher pressure than 1.3Â Pa. The Cr1âxOx coating depicted a dense and compact microstructure with well-attached interface.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yin-Yu Chang, Shun-Jan Yang, Yu-Hsien Liu, Da-Yung Wang,