Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1675203 | Thin Solid Films | 2007 | 5 Pages |
Abstract
Thin films of TiO2 have been prepared by reactive evaporation of Ti2O3 at substrate temperatures from 150 °C to 350 °C and by post‐heating at 150 °C to 850 °C. The mass density of the films increases with increasing substrate and annealing temperature. The crystalline structure of the film prepared at 350 °C is anatase and becomes rutile upon annealing at 850 °C. All other films are amorphous as‐prepared and become anatase upon annealing above 250 °C. The crystallinity is higher for films prepared at lower temperature and does not increase with annealing temperature. Coatings with reproducible optical properties are obtained when deposited and post‐annealed at 250 °C.
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Physical Sciences and Engineering
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Nanotechnology
Authors
Martin Jerman, Dieter Mergel,