Article ID Journal Published Year Pages File Type
1675267 Thin Solid Films 2008 4 Pages PDF
Abstract

Structural, morphological and optical properties of TiO thin films grown by single source thermal evaporation method were studied. The films were annealed from 300 to 520 °C in air after evaporation. Qualitative film analysis was performed with X-ray diffraction, atomic force microscopy and optical transmittance and reflectance spectra. A correlation was established between the optical properties, surface roughness and growth morphology of the evaporated TiO thin films. The X-ray diffraction spectra indicated the presence of the TiO2 phase for the annealing temperature above 400 °C.

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Physical Sciences and Engineering Materials Science Nanotechnology
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