Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1675267 | Thin Solid Films | 2008 | 4 Pages |
Abstract
Structural, morphological and optical properties of TiO thin films grown by single source thermal evaporation method were studied. The films were annealed from 300 to 520 °C in air after evaporation. Qualitative film analysis was performed with X-ray diffraction, atomic force microscopy and optical transmittance and reflectance spectra. A correlation was established between the optical properties, surface roughness and growth morphology of the evaporated TiO thin films. The X-ray diffraction spectra indicated the presence of the TiO2 phase for the annealing temperature above 400 °C.
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Physical Sciences and Engineering
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Authors
M. Zribi, M. Kanzari, B. Rezig,