Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1675278 | Thin Solid Films | 2008 | 4 Pages |
Abstract
Coplanar type transparent thin film transistors (TFTs) have been fabricated on the glass substrates. The devices consist of intrinsic ZnO, Ga doped ZnO (GZO), and amorphous HfO2 for the semiconductor active channel layer, electrode, and gate insulator, respectively. GZO and HfO2 layers were prepared by using a pulsed laser deposition (PLD) and intrinsic ZnO layers were fabricated by using an rf-magnetron sputtering. The transparent TFT exhibits n-channel, enhancement mode behavior. The field effect mobility, threshold voltage, and a drain current on-to-off ratio were measured to be 14.7 cm2/Vs, 2 V, and 105, respectively. High optical transmittance (> 85%) in visible region makes ZnO TFTs attractive for transparent electronics.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Jong Hoon Kim, Byung Du Ahn, Choong Hee Lee, Kyung Ah Jeon, Hong Seong Kang, Sang Yeol Lee,