Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1675606 | Thin Solid Films | 2006 | 5 Pages |
Abstract
Titanium dioxide thin films were grown on a lattice-matched LaAlO3(100) surfaces using pulsed laser deposition (PLD) in oxygen atmosphere. The films were characterized using X-ray diffraction (XRD), reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM). The crystal structure of all the films was anatase. Preferred oriented films with a c-axis normal to the substrate surface were obtained. RHEED analysis also revealed that the films had the preferential in-plane orientation, demonstrating that anatase films were epitaxially grown on the substrate. The flatness of the films depended on their growth conditions and thickness.
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Authors
H. Sakama, G. Osada, M. Tsukamoto, A. Tanokura, N. Ichikawa,