| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1675619 | Thin Solid Films | 2006 | 4 Pages |
Abstract
We report etching processes of epitaxial La0.67(Sr,Ca)0.33 MnO3 (LSCMO) colossal magnetoresistive (CMR) films grown on Bi4Ti3O12/CeO2/YSZ oxide-buffered Si using buffered HF (BHF), potassium hydroxide (KOH) and Ar ion beam etching (IBE) methods. LSCMO films demonstrate high resistivity against the KOH etchant whereas 22 nm/min etching rate was obtained in the BHF with high selectivity over photoresist and Si. Compared to 24 nm/min for Si, Ar IBE yields 16 nm/min etching rate for the LSCMO film and the oxide-buffer layers.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Joo-Hyung Kim, Alexander M. Grishin,