| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1675629 | Thin Solid Films | 2006 | 4 Pages |
Abstract
Crystallized TiO2 films were successfully grown in situ without heating by bipolar-pulse sputtering method at high deposition rates (∼40 nm/min). The optical emission study of the sputtering plasma during growth revealed that the “pulse geometry” had a great influence on the electron/ion temperature of the plasma. It was revealed that the crystallization and the accompanying enhancement in the photocatalytic activity were not caused by the “temperature effect” but caused by the “plasma effect”.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Masayuki Kamei, Takamasa Ishigaki,