| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1675636 | Thin Solid Films | 2006 | 4 Pages |
Abstract
A multilayer nanostructure of 728 alternating WSi2 and Si layers with thicknesses gradually increasing from 10 to â¼58 nm according to the Fresnel zone-plate formula has been fabricated using dc magnetron sputtering. This structure was analyzed with a scanning electron microscope (SEM) and tested with 19.5-keV synchrotron X-rays after sectioning and polishing. Line focus sizes as small as 30.6 nm have been achieved using a sectioned multilayer in transmission diffraction geometry.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chian Liu, R. Conley, A.T. Macrander, J. Maser, H.C. Kang, G.B. Stephenson,