| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1676160 | Thin Solid Films | 2006 | 4 Pages |
Abstract
A Cat-CVD (catalytic chemical vapor deposition, Hot-Wire CVD) apparatus for deposition of large area substrates is developed. Technical issues for a large area deposition apparatus are pointed out and the way to solve such issues is demonstrated, along with deposition performance. It is shown that a large area deposition apparatus as a prototype of future mass-production machine is realized by using the Cat-CVD technology.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Osono, M. Kitazoe, H. Tsuboi, S. Asari, K. Saito,