Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1676297 | Thin Solid Films | 2007 | 4 Pages |
Abstract
Angular dependence of sputtering yields of SiO2 substrates subject to CF3 beam injections is evaluated with the use of molecular dynamics simulations. The obtained sputtering yield data are in reasonable agreement with experimental observations. Atomic compositions in the SiO2-CF mixing layer as well as kinetic energies and atomic compositions of sputtered species also exhibit strong dependence of the injection angle.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Tomohito Kawase, Satoshi Hamaguchi,