Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1676352 | Thin Solid Films | 2007 | 6 Pages |
Abstract
Nanostructures less than 200Â nm in size are created by the Fresnel diffraction of 157Â nm light at the aperture margins of a photomask through proximity irradiation of an octadecyltrimethoxysilane self-assembled monolayer. Photochemical decomposition of the organic monolayer creates complex nanostructure patterns, according to the light intensity distribution at the substrate location. Dimensions and distribution of the nanostructures correlate well with the spatial distribution of the light intensity calculated using the Fresnel equations.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
F.A. Nae, N. Saito, O. Takai,