| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1676361 | Thin Solid Films | 2007 | 4 Pages |
Abstract
A novel internal-type linear inductive antenna, referred to as a “double comb-type antenna”, was used as a large-area plasma source with a substrate area of 880 mm × 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 × 1011 cm− 3, which is 50% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3% within the substrate area was also obtained.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Kyong Nam Kim, Jong Hyeuk Lim, Geun Young Yeom,