| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1676789 | Thin Solid Films | 2006 | 5 Pages |
Abstract
Ordered mesoporous silica films have been prepared by spin-coating using tetraethoxysilane (TEOS) as a silica source and nonionic surfactant Brij 30 as a templating agent. Sulfuric acid (H2SO4), nitric acid (HNO3), or hydrochloric acid (HCl) was mixed as a catalyst in coating solutions. A vapor infiltration treatment was performed using TEOS or trimethylethoxysilane (TMES). The vapor infiltration treatments effectively improved mechanical strength, hydrothermal stability and film adhesive. The dielectric constant of the TMES-treated mesoporous silica film was 1.8.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Shunsuke Tanaka, Hiromi Tada, Takanori Maruo, Norikazu Nishiyama, Yasuyuki Egashira, Korekazu Ueyama,