Article ID Journal Published Year Pages File Type
1677060 Thin Solid Films 2006 6 Pages PDF
Abstract
Molybdenum carbonitride (MoCN) films were deposited on Si (001) and stainless steel substrates by reactive direct-current magnetron sputtering with a molybdenum and graphite composite target. By changing the substrate temperature and the N2 / Ar ratio in the sputtering gas, it is found that good quality MoCN films can be deposited at substrate temperature of 300-400 °C under N2 partial pressure of 0.25-0.5 Pa with a total working pressure of 1 Pa. The structures of the films deposited at such conditions were determined by X-ray diffraction and X-ray photoelectron spectroscopy analysis as nanocrystalline molybdenum carbonitride with a grain size of several ten nanometers was embedded in the amorphous matrix of C and CNx. The hardness of the MoCN films can reach 28 GPa, much higher than the value of MoC and MoN films alone.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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