Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1677123 | Thin Solid Films | 2006 | 4 Pages |
Abstract
GaN-based metal-insulator-semiconductor (MIS) AlGaN/GaN ultraviolet (UV) photodetectors with photo-chemical vapor deposition (Photo-CVD) SiO2 insulator and AR-coating layer were fabricated. It was found that with a 5 V applied bias, photocurrent to dark current contrast ratio was 1.27 × 104 for the MIS photodetector with AR-coating. It was also found that UV-to-visible rejection ratio of such MIS photodetector with AR-coating was more than 3 orders of magnitude while the responsivity was 0.144 A/W with a 5 V applied bias and a 350 nm incident light wavelength.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Ping-Chuan Chang, Chin-Hsiang Chen, Shoou-Jinn Chang, Yan-Kuin Su, Chia-Lin Yu, Bohr-Ran Huang, Po-Chang Chen,