Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1677415 | Ultramicroscopy | 2014 | 8 Pages |
Abstract
•Electron beam-induced deposition of tungsten nano-dot markers was demonstrated.•Markers allowed high quality reconstruction of an agglomerated nanoparticle sample.•Marker size affects alignment accuracy.
A method allowing fabrication of nano-dot markers for electron tomography was developed using an electron beam-induced deposition in an ordinary dual beam instrument (FIB and SEM) or an SEM. The electron beam deposited nano-dot markers are suitable for automatic alignment of tomographic series. The accuracy of the alignment was evaluated and the method was demonstrated on agglomerated nanoparticle samples using a rod-shaped sample with no missing wedge effect. Simulations were used to assess the effect of marker size on alignment accuracy.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Misa Hayashida, Marek Malac, Michael Bergen, Peng Li,