Article ID Journal Published Year Pages File Type
1678733 Ultramicroscopy 2006 15 Pages PDF
Abstract

This study aims to evaluate the spatial resolution achievable with photoelectrons in order to perform localised UPS or XPS analyses on various heterogeneous samples. This investigation is intentionally restricted to direct image acquisition by immersion objective lenses, involving electrons ejected with initial energies of several tenths of an electron-volt. In order to characterise the contribution of all optical elements, analytical investigations were associated to numerical simulations based on SIMION 7 software. The acquisition of high-quality images implies a simultaneous reduction in spherical and chromatic aberrations by a narrow aperture stop placed at the output pupil of the objective. With such limitations in useful emission angles, it is shown that monochromatic electron beams build images with a resolution of about 1 nm, especially for the acceleration bias mode where the focussing electrode is biased at a positive high voltage. Even energy dispersed electron beams, limited by a 4 eV band pass spectrometer, can produce images convenient for highly localised ESCA analyses (resolution 3 nm), where the objective lens is associated with an aperture stop of 30 μm in diameter without using acceleration voltages above 5000 V.

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Physical Sciences and Engineering Materials Science Nanotechnology
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