Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1678763 | Ultramicroscopy | 2009 | 5 Pages |
Abstract
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10 nm in width were resolved.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Joan Vila-Comamala, Konstantins Jefimovs, Jörg Raabe, Tero Pilvi, Rainer H. Fink, Mathias Senoner, Andre Maaßdorf, Mikko Ritala, Christian David,