| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1678977 | Ultramicroscopy | 2008 | 7 Pages |
Abstract
A non-destructive method for measuring the thickness of thin amorphous films composed of light elements has been developed. The method employs the statistics of the phase of the electron exit wave function. The accuracy of this method has been checked numerically by the multislice method and compared with that based on the mean inner potential.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.D. Croitoru, D. Van Dyck, Y.Z. Liu, Z. Zhang,