| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1680345 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2015 | 5 Pages |
Abstract
There a disparity between the way the resolution is specified in microscopy and lithography using light compared to MeV ion microscopy and lithography. In this work we explore the implications of the way the resolution is defined with a view to answering the questions; how are the resolving powers in MeV ion microscopy and lithography relate to their optical counterparts? and how do different forms of point spread function affect the modulation transfer function and the sharpness of the edge profile?
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Rattanaporn Norarat, Harry J. Whitlow,