| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1680439 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2015 | 6 Pages |
Abstract
We present a systematic comparison of two distinct ion-beam based methods for composition analysis of nanometer oxide films: ion-beam channeling and elastic scattering using nuclear resonances, both at MeV energies. Thin films of the technologically highly relevant high-k dielectrics HfO2 and HfAlO are characterized in the present study, with the additional aim of obtaining a better quantification of the Al content for the latter system. We show that both employed ion scattering methods enable a quantitative determination of the oxygen concentrations with typical uncertainties of about 5–10% in the oxygen fraction. The influence of various kinds of systematic inaccuracies in the evaluation procedure are discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
C.J. Zoller, E. Dentoni Litta, D. Primetzhofer,