Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1681130 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2014 | 5 Pages |
Abstract
Rutherford backscattering and channeling spectrometry (RBS/C) as well as transmission electron microscopy (TEM) are used to characterize the crystalline structure of a GaN layer grown on a Si (1 1 1) substrate. The channeling measurements are performed along the off-normal 〈12¯13〉 axis in the {101¯0} plane of the GaN layer. The threading edge dislocation defect density obtained from RBS/C is quantitatively compared to the results obtained from TEM. The strain is found not to be completely relaxed, eT ≠ 0, in spite of the large thickness of the GaN layer (3.0 μm), and in spite of the incorporation of various buffer layers.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
H. Lenka, J. Meersschaut, P.K. Kandaswamy, H. Modarresi, H. Bender, A. Vantomme, W. Vandervorst,