Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1681432 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2010 | 4 Pages |
Abstract
In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 μm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
G. Perotto, V. Bello, T. Cesca, G. Mattei, P. Mazzoldi, G. Pellegrini, C. Scian,