Article ID Journal Published Year Pages File Type
1681780 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2010 6 Pages PDF
Abstract

Nitride films of multi-element TiVCrAlZr alloy were prepared on silicon substrates by reactive radio-frequency magnetron sputtering under different nitrogen/argon flow ratios ranging from 0% to 66.7%. The alloy film deposited in pure argon exhibited an amorphous structure and a very smooth surface, while a face-center-cubic solid-solution structure with strong (2 2 0), (1 1 1) to (2 0 0) orientation and different fracture feature and surface morphologies was observed in those films which were prepared under various nitrogen flow ratios. With increasing nitrogen flow ratio, the hardness and elastic modulus of the films increased and reached maximum values of 11 and 151 GPa at 50%.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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