| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1682272 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2012 | 4 Pages |
Abstract
During implantation a strong redistribution of the cesium ions towards the surface is observed, which occurs already at room temperature and enhances at elevated temperatures. However, almost no cesium ions are lost in that process. Contrary, annealing at elevated temperatures results not only in a diffusion and redistribution of cesium, but also in a significant sublimation/evaporation of cesium into the vacuum. This suggests that during implantation some meta-stable compound is formed which prevents a cesium loss. SEM pictures of the samples show that implantation and subsequent annealing strongly influence the surface structure of the glassy carbon.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
D.F. Langa, N.G. van der Berg, E. Friedland, J.B. Malherbe, A.J. Botha, P. Chakraborty, E. Wendler, W. Wesch,