| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1682274 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2012 | 4 Pages |
Abstract
MD simulation was applied to study disordered NiPd alloy sputtering under normal and oblique incidence of Ar ions at energy E0 = 0.1–20 keV. Energy dependences of NiPd alloys and their components sputtering were studied and discussed for various incidence angles of ions interacting with either disturbed or undisturbed top layers of surfaces. We revealed and explained the essential differences in energy dependences and positions of NiPd single crystal sputtering yield maxima in oblique and normal ion incidence.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
K.A. Tolpin, V.I. Bachurin, V.E. Yurasova,