Article ID Journal Published Year Pages File Type
1682408 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2015 7 Pages PDF
Abstract

Titanium nitride nano-scale thin films have been prepared by ion beam assisted reactive DC magnetron sputtering. The films are characterized by XRD, SEM and TEM. The films are found to be amorphous. The effect of the ion beam during deposition was evident from smoothness of film surface (SEM and TEM images) and modifications in optical properties. Investigation of the optical constants shows stable refractive index dominating most of the visible range. The films are not highly absorptive in the visible range. An energy gap of 2.9 ± 0.1 eV is estimated for the IBAD amorphous titanium nitride nano-thin films. The stability of the films at normal room environment in addition to the golden color makes the nano-thin films suitable for hard and decorative coatings.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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