Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1683381 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2007 | 4 Pages |
Abstract
Poly(siloxaneurethaneureas) (PSURURs) prepared from aromatic and aliphatic isocyanates were investigated upon exposure to ionising radiation. Radicals are formed both in siloxane and urethane segments. In comparison with aliphatic analogues it was found that in aromatic PSURURs: (1) concentration of all radicals is lower, (2) relative concentration of methylene radicals formed in siloxane units is higher, (3) the radiation yield of H2 is more than three times smaller and (4) it seems that efficiency of cross-linking is less significant.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Grażyna Przybytniak, Ewa Kornacka, Janusz Kozakiewicz, Jarosław Przybylski,