| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1683436 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2007 | 8 Pages |
Application of radiation techniques for nanotechnology has been known for years. X-ray, electron beam and ion beam lithography are good examples of applications. By using electron beams, ion beams and X-rays structures as small as 10 nm can be produced. Ion track membranes with track diameters from 10 nm to 100 nm are used as such or as templates for electroplating of nanowires of metal, semiconductor and magnetic materials. In the near future X-rays, focused ion beams and electron beams will be used for nanolithography and 3D fabrication; heavy ion beams on the other hand can be useful for fabrication of nanopores and nanowires. The use of radiation has proved to be an essential technique in the fabrication of nanostructures with high resolution as the radiation beams can be focused into few nanometer scales or less. Three groups of products could be considered to be fabricated by radiation techniques: nanoparticles, nanogels and nanocomposites. These and other possible fields of radiation processing applications in nanotechnology are discussed in the paper.
