Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1683955 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2009 | 4 Pages |
Abstract
Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal masks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–230 nm width were deposited on Si(1 0 0) wafers. He+ ions were implanted through these masks in order to induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface structure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated that regular arrays of both individual hillocks and trough-like circular rings can be generated.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
J.K.N. Lindner, C. Seider, F. Fischer, M. Weinl, B. Stritzker,