| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1683983 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2009 | 5 Pages |
Abstract
TiNi alloy samples implanted with various fluences of 3Â MeV Cu2+ ions were characterized by transmission electron microscope (TEM) and X-ray diffractometer. Cross-sectional TEM images of the samples showed that amorphous region was seen at the fluence of 1014 ions cmâ2 in case of ion implantation at 300Â K of the substrate temperature, but in case of ion implantation at 100Â K it did not appear even at 1015 ions cmâ2. These results were also confirmed by X-ray diffraction profiles of the same samples. Consequently, the extent of microstructure change of TiNi alloy by ion implantation was different depending on the substrate temperature.
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Authors
Noriaki Ikenaga, Yoichi Kishi, Zenjiro Yajima, Noriyuki Sakudo, Shizuka Nakano, Hisato Ogiso,