Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1684235 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2010 | 5 Pages |
Abstract
A specific experimental study has been conducted to better understand the behavior of helium and its diffusion mechanisms in the borosilicate glass. Helium production is simulated by external irradiation with 3He+ ions at a concentration (2 Ã 1015 He cmâ2) equivalent to the one obtained after 1000 years of glass storage. He diffusion coefficients as function of temperature are extracted from the evolution of the depth profiles after annealing. The 3He(d, α) 1H Nuclear Reaction Analysis (NRA) technique is successfully used for in situ low-temperature measurements of depth profiles. Its high depth resolution allows detecting helium mobility at a temperature as low as 250 K and the presence of a trapped helium fraction. The good agreement of our first values of diffusion coefficients with the literature data highlights the relevance of the implantation technique in the study of helium diffusion mechanisms in borosilicate glasses.
Related Topics
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Surfaces, Coatings and Films
Authors
F. Chamssedine, T. Sauvage, S. Peuget,