Article ID Journal Published Year Pages File Type
1684436 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2010 13 Pages PDF
Abstract

Uncured epoxy resin was spun onto silicon wafer and treated by plasma and plasma immersion ion implantation (PIII) by argon ions with energy up to 20 keV. Ellipsometry, FTIR spectroscopy and optical microscopy methods were used for analysis. The etching, carbonization, oxidation and crosslinking effects were observed. The curing reactions in modified epoxy resin are observed without a hardening agent. A model of structural transformations in epoxy resin under plasma and ion beam irradiation is proposed and discussed in relation to processes in a space environment.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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