Self-assembled nano-scale multilayer formation using physical vapor deposition methods

Self-assembled alternating carbon and metal layers have been produced by concurrent deposition of carbon and metal atoms using both dc reactive sputter deposition and mass selected ion beam deposition. High-resolution transmission electron micrographs clearly show the alternating metal-rich and -deficient layers with periodicities in the nanometer scale. The appearance of a multilayer structure and its periodicity strongly depend on the deposition parameters, i.e. the metal species, the provided stoichiometry and the ion energy. Here, we discuss the similarities and differences of the parameters used in both physical vapor deposition methods on the impact on the multilayer structures.