| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1684726 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2007 | 5 Pages |
Abstract
A new method for nanoparticle planar control has been proposed based on optical laser-lithography technique. With this method, the planar spatial resolution of the lithography is improved. Combining the lithography with subsequent ion-irradiation technique, a two-dimensionally (2D) patterned structure of Cu nanoparticles in a silica substrate is obtained with a sub-micrometer spatial resolution. The size of each “spot” is 500 × 500 nm2, and the pitch is 2 μm. Planar TEM image and the result of scanning near-field optical microscopy (SNOM) verify the nanoparticle 2D-patterned distribution. Further improvement of the processing may enable 2D nanoparticle patterning with a pitch on a sub-micrometer scale.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Haisong Wang, Yoshihiko Takeda, Naoki Umeda, Kenichiro Kono, Naoki Kishimoto,