Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1684894 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2009 | 5 Pages |
Abstract
Molecular dynamic simulation has been used to study how the characteristics of metal and binary compound sputtering change under the bombardment by different low-energy ions. The influence of the target parameters on the anomalous mass dependence of sputtering yield has been investigated, both for targets with similar and very different values of density, the lattice constant and the surface binding energy. Together with the ratio of the target atoms’ mass to the mass of the ions, the density of the target and the binding energy turn out to be the important parameters that determine the unusual shape of the mass dependence of sputtering by low-energy ions.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
E.Yu. Zykova, V.E. Yurasova, S.S. Elovikov,