| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1685297 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2007 | 5 Pages |
Abstract
This study tries to shed some light upon these processes by means of a novel approach, the so-called capacitometry measurement for investigating the breakthrough moment and etching processes. It is shown that the capacitometry is a simple but quite reliable technique to determine precisely the moment of track etching breakthrough.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
J. Chen, D. Fink, S. Dhamodaran,