| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1685449 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2012 | 4 Pages |
Abstract
A Si pitch grating has been exposed to a 6 keV Ar+ ion beam at normal angle of incidence as well as at angles of 35° both parallel and perpendicular to the structure. Sputtering of the grating has been observed experimentally by Rutherford back-scattering; the bombardment has been simulated by the SDTrimSP-2D code. The numerical simulations show reasonable agreement with experimental results. A pronounced anisotropy effect has been observed comparing the sputtering of the grating parallel and perpendicular to the structure.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Ivan Bizyukov, Andreas Mutzke, Matej Mayer, Hagen Langhuth, Karl Krieger, Ralf Schneider,