Article ID Journal Published Year Pages File Type
1685522 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2011 5 Pages PDF
Abstract

The lattice expansion in InAs single crystal, due to ion-implantation by 80 keV Be ions with the implantation fluencies ranging from 1 × 1012 to 2 × 1016 cm−2, has been investigated by using high resolution X-ray diffraction (HRXRD), transmission electron microscopy (TEM), and Rutherford backscattering spectrometry/channeling (RBS/C). In order to clarify the evolution of damage buildup, the nonlinear maximum perpendicular strain εm as a function of the Be fluence was obtained and analyzed. The curve of εm vs. Be fluence is subdivided into five regions, each having a different damage accumulation behavior. The involved probable mechanisms of microstructural variation in InAs due to Be implantation of different fluencies are analyzed in detail.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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