Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1686305 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2006 | 4 Pages |
Abstract
MgB2 thin films with Tc = 19 K were fabricated by the ion ablation technique utilizing a high-energy pulsed ion beam. A target remains pure MgB2 after ablation, proving the excellent capability of ablation by the high-power ion beam. Chemical compositions of the deposited material, however, may vary with positions of the substrates from the beam axis. X-ray diffraction patterns exhibit only (0 0 1) and (0 0 2) peaks, which indicate a c-axis orientation of the films. Scanning electron microscopy images show a possible growth of single crystals with hexagonal shape and 1 μm size.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Y. Fudamoto, T.J. Renk, G.A. Torres, N. Kishimoto,